| Process Technology | |
|---|---|
| Fabricated By | IDT |
| Process | http://cpudb.stanford.edu/technologies/50 |
| Technology | CMOS |
| Feature Size [μm] | 0.35 |
| Channel Length [μm] | 0.35 |
| Metal Layers | 3 |
| Metal Type | aluminum |
| FO4 Delay [ps] | 126.0 |
| Year | 1996 |
| Nominal Vdd | 3.30 |
| Vth* | 0.6 |
| Designer | Family | Code Name | Model | μarch | Released | Cache | Vdd | Feature Size | FO4 | Clock | TDP | SPECInt 1992 | SPECFp 1992 | SPECInt 1995 | SPECFp 1995 | SPECInt 2000 | SPECFp 2000 | SPECInt 2006 | SPECFp 2006 | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| MIPS | R5000 | R5000 | 1996-01-01 | 512 | 3.30 | 0.35 | 126.0 | 150.0 | 3.3 | 4.4 | details | |||||||||
| MIPS | R5000 | R5000 | 1996-01-01 | 512 | 3.30 | 0.35 | 126.0 | 180.0 | 4.6 | 4.9 | details | |||||||||
| MIPS | R5000 | R5000 | 1996-01-01 | 64 | 3.30 | 0.35 | 126.0 | 200.0 | 5.7 | details | ||||||||||
| MIPS | R5000 | R5000 | 1996-01-01 | 64 | 3.30 | 0.35 | 126.0 | 250.0 | 6.6 | details |