Process Technology | |
---|---|
Fabricated By | Fujitsu |
Process | http://cpudb.stanford.edu/technologies/19 |
Technology | CMOS |
Feature Size [μm] | 0.5 |
Channel Length [μm] | 0.5 |
Metal Layers | 3 |
Metal Type | |
FO4 Delay [ps] | 180.0 |
Year | 1994 |
Nominal Vdd | 3.30 |
Vth* | 0.8 |
Designer | Family | Code Name | Model | μarch | Released | Cache | Vdd | Feature Size | FO4 | Clock | TDP | SPECInt 1992 | SPECFp 1992 | SPECInt 1995 | SPECFp 1995 | SPECInt 2000 | SPECFp 2000 | SPECInt 2006 | SPECFp 2006 | |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Fujitsu | microSPARC II | Swift | 1994-06-01 | 10 | 3.30 | 0.5 | 180.0 | 60.0 | 45.3 | 37.8 | details | |||||||||
Fujitsu | microSPARC II | Swift | 1994-06-01 | 10 | 3.30 | 0.5 | 180.0 | 70.0 | 49.8 | 44.5 | details | |||||||||
Fujitsu | microSPARC II | Swift | 1994-06-01 | 10 | 3.30 | 0.5 | 180.0 | 85.0 | 56.8 | 51.2 | details | |||||||||
Ross | hyperSPARC | Colorado 2 | 1994-06-01 | 8 | 3.30 | 0.5 | 180.0 | 100.0 | 99.2 | 118.4 | details | |||||||||
Ross | hyperSPARC | Colorado 2 | 1994-06-01 | 8 | 3.30 | 0.5 | 180.0 | 125.0 | 123.3 | 140.6 | details |