Toshiba 0.7μm CMOS (VHMOSIII)
| Process Technology |
| Fabricated By |
Toshiba |
| Process |
VHMOSIII |
| Technology |
CMOS |
| Feature Size [μm] |
0.7 |
| Channel Length [μm] |
0.7 |
| Metal Layers |
3 |
| Metal Type |
|
| FO4 Delay [ps] |
252.0
|
| Year |
1994 |
| Nominal Vdd |
3.30 |
| Vth* |
1.0
|
Fabricated processors
| Designer |
Family |
Code Name |
Model |
μarch |
Released |
Cache |
Vdd |
Feature Size |
FO4 |
Clock |
TDP |
SPECInt 1992 |
SPECFp 1992 |
SPECInt 1995 |
SPECFp 1995 |
SPECInt 2000 |
SPECFp 2000 |
SPECInt 2006 |
SPECFp 2006 |
|
| MIPS |
R8000
|
|
R8000
|
R8000
|
1994-06-07 |
32 |
3.30 |
0.7 |
252.0
|
75.0 |
13.0 |
102.6 |
266.2 |
|
|
|
|
|
|
details |
| MIPS |
R8000
|
|
R8010
|
R8000
|
1994-06-07 |
32 |
3.30 |
0.7 |
252.0
|
75.0 |
13.0 |
|
|
|
|
|
|
|
|
details |