| Process Technology | |
|---|---|
| Fabricated By | Samsung |
| Process | http://cpudb.stanford.edu/technologies/91 |
| Technology | CMOS |
| Feature Size [μm] | 0.28 |
| Channel Length [μm] | 0.28 |
| Metal Layers | |
| Metal Type | |
| FO4 Delay [ps] | 100.8 |
| Year | 1998 |
| Nominal Vdd | 2.50 |
| Vth* | 0.6 |
| Designer | Family | Code Name | Model | μarch | Released | Cache | Vdd | Feature Size | FO4 | Clock | TDP | SPECInt 1992 | SPECFp 1992 | SPECInt 1995 | SPECFp 1995 | SPECInt 2000 | SPECFp 2000 | SPECInt 2006 | SPECFp 2006 | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| DEC | Alpha 21164PC | PCA57 | 1998-11-01 | 96 | 2.50 | 0.28 | 100.8 | 600.0 | 20.0 | details |