Intel 0.35μm BICMOS (P854)
Process Technology |
Fabricated By |
Intel |
Process |
P854 |
Technology |
BICMOS |
Feature Size [μm] |
0.35 |
Channel Length [μm] |
0.2 |
Metal Layers |
4 |
Metal Type |
|
FO4 Delay [ps] |
72.0
|
Year |
1994 |
Nominal Vdd |
2.50 |
Vth* |
0.6
|
Delay-Voltage Measurements
Gate |
Voltage |
Fanout |
Delay |
Delay (inv equivalent) |
Delay (inv equivalent) @ 2.50V |
nmos |
2.5 |
1.0 |
7.0 |
21.0
|
21.0
|
pmos |
2.5 |
1.0 |
14.0 |
21.0
|
21.0
|
Fabricated processors
Designer |
Family |
Code Name |
Model |
μarch |
Released |
Cache |
Vdd |
Feature Size |
FO4 |
Clock |
TDP |
SPECInt 1992 |
SPECFp 1992 |
SPECInt 1995 |
SPECFp 1995 |
SPECInt 2000 |
SPECFp 2000 |
SPECInt 2006 |
SPECFp 2006 |
|