Process Technology | |
---|---|
Fabricated By | Hitachi |
Process | http://cpudb.stanford.edu/technologies/28 |
Technology | BICMOS |
Feature Size [μm] | 0.5 |
Channel Length [μm] | 0.5 |
Metal Layers | 4 |
Metal Type | aluminum |
FO4 Delay [ps] | 180.0 |
Year | 1994 |
Nominal Vdd | 3.30 |
Vth* | 0.8 |