| Process Technology | |
|---|---|
| Fabricated By | Toshiba |
| Process | http://cpudb.stanford.edu/technologies/104 |
| Technology | CMOS |
| Feature Size [μm] | 0.25 |
| Channel Length [μm] | 0.25 |
| Metal Layers | 4 |
| Metal Type | aluminum |
| FO4 Delay [ps] | 90.0 |
| Year | 1998 |
| Nominal Vdd | 2.50 |
| Vth* | 0.6 |
| Designer | Family | Code Name | Model | μarch | Released | Cache | Vdd | Feature Size | FO4 | Clock | TDP | SPECInt 1992 | SPECFp 1992 | SPECInt 1995 | SPECFp 1995 | SPECInt 2000 | SPECFp 2000 | SPECInt 2006 | SPECFp 2006 | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| SGI | R12000 | R12000 | 1998-11-01 | 64 | 2.50 | 0.25 | 90.0 | 270.0 | 14.9 | 23.7 | details | |||||||||
| SGI | R12000 | R12000 | 1998-11-01 | 64 | 2.50 | 0.25 | 90.0 | 300.0 | 30.0 | details | ||||||||||
| SGI | R12000 | R12000 | 1998-11-01 | 64 | 2.50 | 0.25 | 90.0 | 350.0 | 280.0 | 278.0 | details | |||||||||
| SGI | R12000 | R12000 | 1998-11-01 | 64 | 2.50 | 0.25 | 90.0 | 360.0 | 277.0 | 274.0 | details |